Yi-Wang Jhan

Title: Yi-Wang Jhan: Innovator in Semiconductor Technology

Introduction

Yi-Wang Jhan is a prominent inventor based in Quanzhou, China, known for his significant contributions to semiconductor technology. With a total of seven patents to his name, Jhan has made remarkable advancements in the field, particularly in semiconductor structures and fabrication methods.

Latest Patents

Among his latest patents is a semiconductor structure and method for forming the same. This invention includes a substrate, a first dielectric layer, a second dielectric layer, and a conductive layer, all designed to enhance the performance and reliability of semiconductor devices. Another notable patent involves a method for fabricating a semiconductor structure, which outlines a detailed process for creating connection patterns and merged patterns through innovative photomask techniques.

Career Highlights

Jhan is currently employed at Fujian Jinhua Integrated Circuit Co., Ltd., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing advanced technologies that are crucial for modern electronic devices.

Collaborations

Throughout his career, Jhan has collaborated with talented individuals such as Yu-Cheng Tung and Xiaopei Fang, contributing to a dynamic and innovative work environment.

Conclusion

Yi-Wang Jhan's contributions to semiconductor technology exemplify the spirit of innovation and dedication to advancing the field. His patents and ongoing work at Fujian Jinhua Integrated Circuit Co., Ltd. highlight his role as a key figure in the industry.