Yi-Sin Wang

Title: Yi-Sin Wang: Innovator in Semiconductor Technology

Introduction

Yi-Sin Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the efficiency and performance of semiconductor devices.

Latest Patents

One of Yi-Sin Wang's latest patents is titled "Minimization of silicon germanium facets in planar metal oxide semiconductor structures." This patent discloses a method and apparatus for minimizing silicon germanium facets in planar metal oxide semiconductor structures. A device fabricated according to this method may include a semiconductor substrate, a plurality of gate stacks formed on the substrate, and a plurality of source/drain regions formed from silicon germanium. Additionally, a shallow trench isolation region is positioned between two source/drain regions, ensuring that it forms a trench in the substrate without intersecting the two source/drain regions.

Career Highlights

Yi-Sin Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor technology. His expertise and inventions have contributed to advancements in the industry.

Collaborations

Throughout his career, Yi-Sin Wang has collaborated with notable colleagues, including Shao-Yu Chen and Chih-Ping Chao. These collaborations have further enhanced his research and development efforts.

Conclusion

Yi-Sin Wang is a key figure in the semiconductor industry, with a focus on innovative solutions that enhance device performance. His contributions through patents and collaborations reflect his commitment to advancing technology in this critical field.