Taiwan Semiconductor Manufacturing Comp. Ltd.

Yi-Sin Wang

Chun-Hung Chen

Chung-Long Chang

Ching-Hung Kao

Chih-Ping Chao

Kuan-Chi Tsai

Wei-Kung Tsai

Ching-Chung Hsu

Shao-Yu Chen

Shan-Yun Cheng

Hsiang-Chi Chen

Jing-Jyu Chou

Cheng-Chang Hsu

Yi-Ting Chen

Shih-Feng Huang

Chi-Hsu Chiu

Arjit Ashok

A method and apparatus for minimizing silicon germanium facets in planar metal oxide semiconductor structures is disclosed. For example, a device fabricated according to the method may include a semiconductor substrate, a plurality of gate stacks formed on the substrate, a plurality of source/drain regions formed from silicon germanium, and a shallow trench isolation region positioned between two source/drain regions of the plurality of source/drain regions. Each source/drain region of the plurality of source/drain regions is positioned adjacent to at least one gate stack of the plurality of gate stacks. Moreover, the shallow trench isolation region forms a trench in the substrate without intersecting the two source/drain regions.

Minimization of silicon germanium facets in planar metal oxide semiconductor structures

A device includes a dielectric layer, an interlayer metal pad in the dielectric layer, a first capacitor over the interlayer metal pad, and a second capacitor over the dielectric layer. The first capacitor includes a first bottom capacitor electrode over and in contact with the interlayer metal pad, a first top capacitor electrode, and a first inter-electrode dielectric layer between the first bottom capacitor electrode and the first top capacitor electrode. The second capacitor includes a second bottom capacitor electrode over and in contact with the dielectric layer, a second top capacitor electrode, and a second inter-electrode dielectric layer between the second bottom capacitor electrode and the second top capacitor electrode.

Integrated circuit

An integrated circuit includes a stacked MIM capacitor and a thin film resistor and methods of fabricating the same are disclosed. A capacitor bottom metal in one capacitor of the stacked MIM capacitor and the thin film resistor are substantially at the same layer of the integrated circuit, and the capacitor bottom metal and the thin film resistor are also made of substantially the same materials. The integrated circuit with both of a stacked MIM capacitor and a thin film resistor can be made in a cost benefit way accordingly, so as to overcome disadvantages mentioned above.

Integrated circuit and manufacturing method thereof

The disclosure is related a method for testing and measuring the performances of electrical components on a semiconductor IC device through a test apparatus (also referred to as a testline) disposed in a scribe line between the semiconductor IC devices on a wafer. The test apparatus may include a built-in self-test (BIST) circuit and a duplication of the electrical components subjected to the performance measurement. Minimum and maximum testing voltages are provided to the test apparatus, where the range of voltage between the minimum and maximum testing voltages are divided into a plurality of testing operational voltages which are applied to the test apparatus. For each testing operational voltages, a memory array operation test is performed, where at least one of the testing operational voltages resulting in a performance failure is identified as the minimal operating voltage of the memory array.

Apparatus and method for measuring performance of memory array

Growing community of inventors

Tainan, Taiwan

Yi-Sin Wang