Yi Hsien Lu

Title: Yi Hsien Lu: Innovator in Semiconductor Technology

Introduction

Yi Hsien Lu is a prominent inventor based in Yuanchang, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on innovative methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of Yi Hsien Lu's latest patents involves a semiconductor device and the manufacturing method thereof. In this method, a memory cell structure covered by a protective layer is formed in a memory cell area of a substrate. A mask pattern is created, featuring an opening over a first circuit area, while the memory cell area and a second circuit area are shielded by the mask pattern. The substrate in the first circuit area is recessed, while the memory cell area and the second circuit area remain protected. A first field effect transistor (FET) with a first gate dielectric layer is formed in the first circuit area over the recessed substrate, and a second FET with a second gate dielectric layer is formed in the second circuit area over the substrate as viewed in cross-section.

Career Highlights

Yi Hsien Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Yi Hsien Lu has collaborated with notable colleagues, including Wei Cheng Wu and Harry-Hak-Lay Chuang. These partnerships have further enhanced his contributions to the field and fostered a collaborative environment for innovation.

Conclusion

Yi Hsien Lu's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing electronic manufacturing processes. His patents and collaborations continue to influence the industry, making him a significant figure in the realm of technology.