Yeong-Rong Chang

Title: Yeong-Rong Chang: Innovator in Semiconductor Technology

Introduction

Yeong-Rong Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative methods have advanced the processes involved in wafer fabrication and photoresist adhesion.

Latest Patents

Chang's latest patents include a method for plasma etching a wafer after backside grinding. This method incorporates an oxidation pretreatment step, which involves grinding the backside of a wafer to expose a bare silicon surface. The bare silicon surface is then oxidized to form a uniform silicon oxide layer, followed by positioning the wafer in a plasma etch chamber for etching without further silicon oxide formation. Another notable patent focuses on improving photoresist adhesion on a metal layer after rework, which involves roughening the ARC layer's upper surface to enhance the adhesion of a second photoresist layer.

Career Highlights

Throughout his career, Yeong-Rong Chang has worked with Taiwan Semiconductor Manufacturing Company, where he has honed his skills and contributed to various projects. His expertise in semiconductor processes has made him a valuable asset in the industry.

Collaborations

Chang has collaborated with notable colleagues, including Gau-Ming Lu and Wen-Han Hung, further enhancing his contributions to semiconductor technology.

Conclusion

Yeong-Rong Chang's innovative work in semiconductor technology, particularly in wafer processing and photoresist adhesion, showcases his significant impact on the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.