The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Mar. 20, 2002
Gau-Ming Lu, Hsin-Chu, TW;
Dowson Jang, Hsin-Chu, TW;
Wen-Han Hung, Hsin-Chu, TW;
Yeong-Rong Chang, Hsin-Chu, TW;
Other;
Abstract
A method of improving photoresist adhesion in a reworked device, including the following steps. A semiconductor structure having an upper exposed metal layer is provided. An ARC layer is formed over the upper exposed metal layer. The ARC layer having an upper surface. A first photoresist layer is formed upon the ARC layer. The first photoresist layer is removed by a rework process. The ARC layer upper surface is roughened to form a roughened ARC layer upper surface. A second photoresist layer is formed upon the roughened ARC layer upper surface whereby adhesion of the second photoresist layer to the ARC layer is improved.