Wen-Han Hung

Title: Innovations by Wen-Han Hung in Photoresist Technology

Introduction

Wen-Han Hung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in improving photoresist adhesion processes. His innovative methods have the potential to enhance the efficiency and reliability of semiconductor devices.

Latest Patents

Wen-Han Hung holds a patent titled "Photoresist adhesion improvement on metal layer after photoresist rework by extra N2O treatment." This patent describes a method for improving photoresist adhesion in a reworked device. The process involves several steps, including providing a semiconductor structure with an upper exposed metal layer, forming an ARC layer over this metal layer, and applying a first photoresist layer. After the first photoresist layer is removed through a rework process, the ARC layer's upper surface is roughened. Finally, a second photoresist layer is formed on the roughened surface, which significantly improves adhesion.

Career Highlights

Wen-Han Hung has demonstrated a strong commitment to advancing semiconductor technology through his innovative approaches. His work has been recognized for its practical applications in the industry, particularly in enhancing the performance of semiconductor devices.

Collaborations

Wen-Han has collaborated with notable colleagues, including Gau-Ming Lu and Dowson Jang. These collaborations have contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Wen-Han Hung's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patent on improving photoresist adhesion showcases his expertise and commitment to enhancing device performance.