Yen-Kai Huang

Title: Yen-Kai Huang: Innovator in Semiconductor Technology

Introduction

Yen-Kai Huang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative work focuses on methods for repairing masks used in semiconductor manufacturing, which is crucial for the production of high-quality microchips.

Latest Patents

One of his latest patents is titled "Method for repairing a mask." This method involves receiving a mask with first and second defective regions. A first treatment is performed on the mask, followed by a first repair process that addresses the first defective region, resulting in a first repaired defective region. After a second treatment, a second repair process is conducted to repair the second defective region, forming a second repaired defective region. Another notable patent is "Efficient solution for removing EUV native defects." This patent describes a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. The process includes identifying a printable native defect, removing a section of the substrate, and inserting a multi-layer replacement section devoid of defects.

Career Highlights

Yen-Kai Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing semiconductor manufacturing technologies.

Collaborations

He collaborates with talented coworkers, including Yuan-Chih Chu and Hsun-Chuan Shih, who contribute to the innovative environment at TSMC.

Conclusion

Yen-Kai Huang's contributions to semiconductor technology through his patents and work at TSMC highlight his role as a significant inventor in the industry. His innovative methods for repairing masks and addressing native defects are vital for the advancement of semiconductor manufacturing.