The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Oct. 11, 2013
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Yen-Kai Huang, Hsinchu, TW;
Yuan-Chih Chu, Taipei, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); G03F 1/72 (2012.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 1/22 (2013.01);
Abstract
A method for repairing a mask is disclosed. A mask, having multiple defective regions need to be repaired, is received. Locations and sizes of the defective regions are determined. A pre-repair-passivation-treatment (PRPT) is performed to form a passivation membrane over the mask. With the passivation membrane on the mask, a mask repair process is performed to the defective regions on the mask.
Huang, Yen-Kai. (2016). Method for repairing a mask (U.S. Patent No. 9291890). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9291890
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile