This inventor holds 3 USPTO granted patents. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Industrial Technology Research Institute. Active years: 2015-2020.
Company Filing History:
2 out of 42,711 
1 out of 9,299 
Years Active: 2015-2020
Title: Yen-Chen Lin: Innovator in Polyester Elastomers and Photoresist Coating Technologies
Introduction
Yen-Chen Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of polyester elastomers and photoresist coating methods. With a total of 3 patents to his name, Lin's work has had a considerable impact on various industries.
Latest Patents
One of Lin's latest patents is focused on a polyester elastomer. This innovative material is created by reacting an amide oligomer, polyalkylene glycol, and poly(alkylene arylate). The amide oligomer features a specific chemical structure, where R represents a Calkylene group, and x is an integer ranging from 10 to 20. The polyalkylene glycol also has a defined structure, with R as a Calkylene group and y being an integer from 20 to 30. Lastly, the poly(alkylene arylate) includes a chemical structure where Ar is a Calkylene group, and z is an integer between 1 and 10.
Another significant patent by Lin involves a photoresist coating scheme. This method includes rotating a wafer at a first speed for a designated time. Following this, the wafer is rotated at a lower second speed for a second duration, and then at a higher third speed for a third duration. During the first time duration and part of the interval that includes the second and third durations, a photoresist is dispensed on the wafer.
Career Highlights
Yen-Chen Lin has worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking innovations in his field.
Collaborations
Lin has collaborated with several talented individuals, including Chia-Hung Chu and Hong-Hsing Chou, who is a woman. These collaborations have further enhanced his research and development efforts.
Conclusion
Yen-Chen Lin is a distinguished inventor whose work in polyester elastomers and photoresist coating technologies has made a lasting impact. His patents reflect his innovative spirit and dedication to advancing materials science.