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For the Inventor, By the Inventor

Kumamoto, Japan

Yasuo Kiyohara

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Kiyohara. Retrieved from https://idiyas.com/inventor/yasuo-kiyohara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 83.3

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:

goldMedal6 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2018-2026

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6 patents (USPTO):Explore Patents
1. 12635446 - Substrate processing apparatus and substrate processing method (2026-05-19),
2. 11735439 - Substrate processing system and method for supplying processing fluid (2023-08-22),
3. 11482427 - Substrate processing system and method for supplying processing fluid (2022-10-25),
4. 10796897 - Supercritical fluid producing apparatus and substrate processing apparatus (2020-10-06),
5. 10593571 - Substrate processing apparatus (2020-03-17),
6. 10067514 - Substrate processing apparatus and liquid mixing method (2018-09-04),

Title: Yasuo Kiyohara: Innovator in Substrate Processing Technology

Introduction

Yasuo Kiyohara is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 6 patents. His innovative work has advanced the methods and systems used in processing fluids, which are essential in various industrial applications.

Latest Patents

Kiyohara's latest patents include a substrate processing system and a method for supplying processing fluid. The processing fluid supplying method involves supplying a gaseous state processing fluid to a circulation line, generating a liquid state processing fluid by cooling the gaseous state fluid, and branching the liquid state fluid to a branch line. Additionally, it includes generating a supercritical state processing fluid by heating the liquid state fluid in the circulation line. The substrate processing system comprises a substrate processing apparatus designed to process a substrate with a processing fluid, along with a processing fluid supply apparatus that includes a circulation line, gas supply line, cooler, pump, branch line, heating unit, and pressure regulator.

Career Highlights

Yasuo Kiyohara is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in developing advanced technologies that enhance substrate processing efficiency and effectiveness.

Collaborations

Kiyohara has collaborated with notable colleagues such as Hiroaki Inadomi and Satoshi Okamura. Their combined expertise has contributed to the successful development of innovative solutions in the field.

Conclusion

Yasuo Kiyohara's contributions to substrate processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in processing fluid systems, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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