The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Nov. 18, 2014
Tokyo Electron Limited, Tokyo, JP;
Yasuo Kiyohara, Kumamoto, JP;
Ikuo Sunaka, Kumamoto, JP;
Koji Tanaka, Beaverton, OR (US);
Takami Satoh, Kumamoto, JP;
Kazuyoshi Mizumoto, Kumamoto, JP;
Takashi Uno, Kumamoto, JP;
Hirotaka Maruyama, Kumamoto, JP;
Hidetomo Uemukai, Kumamoto, JP;
Tomiyasu Maezono, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus includes a mixing tank, a first opening/closing valve, a second opening/closing valve, a first flow rate measuring unit, a second flow rate measuring unit, a control unit, and a substrate processing unit. A first liquid and a second liquid are mixed such that the second liquid is mixed in an amount more than that of the first liquid. The first and second opening/closing valves open/close a first flow path and a second flow path, respectively. The first and second flow rate measuring units measure flow rates of the first and second liquids flowing through the first and second flow paths, respectively. The control unit controls opening/closing of the first opening/closing valve and the second opening/closing valve. The substrate processing unit processes a substrate by supplying a mixed liquid of the first and second liquids to the substrate.