The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Feb. 07, 2023
Tokyo Electron Limited, Tokyo, JP;
Yasuo Kiyohara, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes: a processing container including an internal space where a supercritical drying process is performed on a substrate having a surface to which a liquid is attached, by using a processing fluid in a supercritical state; a housing including a processing region where the processing container is disposed, and a carry-in/out region where carry-in/out of the substrate is performed; a delivery section that is provided in the carry-in/out region to deliver the substrate to/from a substrate transfer arm entering the carry-in/out region from an outside of the housing; a substrate transfer section that transfers the substrate between the delivery section and the processing container; and a gas supply provided in the carry-in/out region to supply a dry gas to the processing container.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile