The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Mar. 23, 2017
Tokyo Electron Limited, Tokyo, JP;
Hiroaki Inadomi, Kumamoto, JP;
Tooru Nakamura, Kumamoto, JP;
Kouji Kimoto, Kumamoto, JP;
Yasuo Kiyohara, Kumamoto, JP;
Satoshi Okamura, Kumamoto, JP;
Satoshi Biwa, Kumamoto, JP;
Nobuya Yamamoto, Kumamoto, JP;
Katsuhiro Ookawa, Kumamoto, JP;
Keiichi Yahata, Kumamoto, JP;
Tetsuro Nakahara, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.