Tokyo, Japan

Yasunori Goto

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 18(Granted Patents)


Location History:

  • Hitachinaka, JP (2008)
  • Tokyo, JP (1998 - 2023)

Company Filing History:


Years Active: 1998-2025

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11 patents (USPTO):

Title: Yasunori Goto: Innovator in Charged Particle Beam Technology

Introduction

Yasunori Goto is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of charged particle beam technology. With a total of 11 patents to his name, Goto has developed innovative methods and apparatuses that enhance the capabilities of semiconductor pattern recognition.

Latest Patents

One of Goto's latest patents is a method, apparatus, and program for determining conditions related to captured images of charged particle beam apparatuses. This invention provides a systematic approach to recognizing semiconductor patterns by acquiring multiple captured images and detecting emitted electrons. The method involves using a processor to calculate features based on various imaging conditions, ensuring accurate recognition of patterns. Another notable patent is for a pattern inspecting device that generates a difference waveform from a backscattered electron image. This device determines the presence of shielded regions on the side walls of patterns, enhancing the precision of semiconductor inspections.

Career Highlights

Throughout his career, Yasunori Goto has worked with leading companies in the technology sector, including Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His work has significantly impacted the development of advanced imaging techniques and semiconductor manufacturing processes.

Collaborations

Goto has collaborated with notable colleagues such as Takuma Yamamoto and Yuji Takagi, contributing to various projects that push the boundaries of technology in the semiconductor industry.

Conclusion

Yasunori Goto's innovative work in charged particle beam technology and his numerous patents reflect his dedication to advancing semiconductor pattern recognition. His contributions continue to influence the field and inspire future innovations.

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