The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Aug. 25, 2023
Hitachi High-tech Corporation, Tokyo, JP;
Takahiro Nishihata, Tokyo, JP;
Atsushi Miyamoto, Tokyo, JP;
Takuma Yamamoto, Tokyo, JP;
Yasunori Goto, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
An image of a sample captured by a microscope includes a first layer template image and a second layer template image indicating pattern shapes of a first layer and a second layer. Pattern matching of the second layer is performed based on the second layer template image to acquire a second position deviation amount related to the second layer and an area recognized as the second layer. Pattern matching processing of the first layer is performed based on a first layer consideration range, the first layer template image, and the image to acquire a first position deviation amount related to the first layer and an area recognized as the first layer on the image to be measured. An overlay is measured based on the second position deviation amount and the first position deviation amount.