The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2023
Filed:
Oct. 14, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Keiichiro Hitomi, Tokyo, JP;
Kenji Tanimoto, Tokyo, JP;
Yusuke Abe, Tokyo, JP;
Takuma Yamamoto, Tokyo, JP;
Kei Sakai, Tokyo, JP;
Satoru Yamaguchi, Tokyo, JP;
Yasunori Goto, Tokyo, JP;
Shuuichirou Takahashi, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is a charged particle beam device capable of focusing with high accuracy even when a charged particle beam has a large off-axis amount. The charged particle beam device generates an observation image of a sample by irradiating the sample with a charged particle beam, and includes: a deflection unit that inclines the charged particle beam; a focusing lens that focuses the charged particle beam; an adjustment unit that adjusts a lens strength of the focusing lens based on an evaluation value calculated from the observation image; a storage unit that stores a relationship between a visual field movement amount and the lens strength; and a filter setting unit that calculates the visual field movement amount based on an inclination angle of the charged particle beam and the relationship, and sets an image filter to be superimposed on the observation image based on the calculated visual field movement amount.