Yasuhiro Omura

This inventor holds 83 USPTO granted patents and 1 published patent application and 11 EPO patents, primarily in Projection Optical Systems (CPC class G03F7-70341). Top assignees: Nikon Corporation, Olympus Optical Company, Ltd.. Active years: 1991-2018.

USPTO Granted Patents = 83 (Patent Applications = 1)

% Patents Active = 42.2

EPO Patents = 11 (Patent Applications = 14)

Average Co-Inventor Count = 1.6

ph-index = 22

Forward Citations = 1,214(Granted Patents)

Forward Citations (Not Self Cited) = 1,107(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Hachioji, JP (1991)
Tokio, JP (1999)
Chuo-ku, JP (2001 - 2004)
Kumgaya, JP (2004)
Chiyoda-ku, JP (2004)
Kainosu, JP (2009)
Tokyo, JP (1992 - 2016)
Kounosu-shi, JP (2016)
Kumagaya, JP (2003 - 2018)
Kounosu, JP (2008 - 2018)

Company Filing History:

Olympus Optical Company, Ltd.

patents

Years Active: 1991-2018

Loading Chart...

Areas of Expertise:

Projection Optical System

Exposure Apparatus

Exposure Method

Device Manufacturing

Catadioptric Imaging

Photolithography

Immersion Objective

Optical System

Device Fabrication

Boundary Optical Element

Reducing Immersion

3D Stacking

83 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10156792 - Projection optical system, exposure apparatus, and exposure method (2018-12-18),

2. 10048602 - Exposure apparatus, exposure method, and method for producing device (2018-08-14),

3. 9933705 - Reduction projection optical system, exposure apparatus, and exposure method (2018-04-03),

4. 9891539 - Projection optical system, exposure apparatus, and exposure method (2018-02-13),

5. 9846366 - Projection optical system, exposure apparatus, and exposure method (2017-12-19),

6. 9606443 - Reducing immersion projection optical system (2017-03-28),

7. 9500943 - Projection optical system, exposure apparatus, and exposure method (2016-11-22),

8. 9429851 - Projection optical system, exposure apparatus, and exposure method (2016-08-30),

9. 9360763 - Projection optical system, exposure apparatus, and exposure method (2016-06-07),

10. 9316921 - Exposure apparatus, exposure method, and method for producing device (2016-04-19),

11. 9310696 - Projection optical system, exposure apparatus, and exposure method (2016-04-12),

12. 9086635 - Projection optical system, exposure apparatus, and exposure method (2015-07-21),

13. 9081295 - Catadioptric projection optical system, exposure apparatus, and exposure method (2015-07-14),

14. 8854601 - Projection optical system, exposure apparatus, and exposure method (2014-10-07),

15. 8665418 - Projection optical system, exposure apparatus, and device manufacturing method (2014-03-04),

Title: The Innovative Journey of Inventor Yasuhiro Omura

Introduction: Yasuhiro Omura is a pioneering inventor hailing from Kumagaya, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yasuhiro Omura holds several patents in the realm of electronics and robotics, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Yasuhiro Omura has worked tirelessly to develop cutting-edge solutions that have revolutionized the industry. His keen eye for detail and passion for innovation have led to the creation of numerous groundbreaking inventions.

Collaborations: Throughout his career, Yasuhiro Omura has collaborated with leading tech companies and research institutions, pooling together expertise to drive innovation forward. His collaborative spirit has been instrumental in the success of many projects.

Conclusion: Yasuhiro Omura stands as a testament to the power of innovation and dedication in the world of technology. His relentless pursuit of excellence and unwavering commitment to pushing the boundaries of what is possible make him a true trailblazer in the field of inventions.