The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Feb. 20, 2009
Applicant:

Yasuhiro Omura, Kumagaya, JP;

Inventor:

Yasuhiro Omura, Kumagaya, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 17/00 (2006.01); G03F 7/20 (2006.01); G02B 9/34 (2006.01); G02B 17/08 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); G02B 9/34 (2013.01); G02B 17/0844 (2013.01); G03F 7/70225 (2013.01); G03F 7/70341 (2013.01); H01L 21/027 (2013.01);
Abstract

A catadioptric projection optical system includes a plurality of lenses which are arranged between a first plane on which the pattern is arranged and a second plane on which the substrate is arranged. Two mirrors are arranged in an optical path of the light beam between the plurality of lenses and the second plane. A dioptric optical system is arranged in an optical path of the light beam between the two mirrors and the second plane the dioptric optical system forming the image of the pattern onto the second plane by the light beam from the two mirrors. The dioptric optical system includes a first negative lens and a second negative lens, the second negative lens being adjacent to the first negative lens along the single optical axis.


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