Yasuhiko Sato

This inventor holds 15 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Nippon Shokubai Co., Ltd.. Active years: 1999-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiko Sato. Retrieved from https://idiyas.com/inventor/yasuhiko-sato

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 15

% Patents Active = 60.0

Average Co-Inventor Count = 3.5

ph-index = 7

Forward Citations = 562(Granted Patents)

Location History:

Kanagawa-ken, JP (1999)
Yokohama, JP (1999 - 2007)
Yokosuka, JP (2003 - 2007)
Yokkaichi, JP (2007)

Company Filing History:

14 out of 53,315

Kabushiki Kaisha Toshiba

patents

1 out of 1,335

Nippon Shokubai Co., Ltd.

patents

Years Active: 1999-2007

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Areas of Expertise:

Pattern Formation

Semiconductor Device

Alkoxylated Compound

Hybrid Exposure

Mask Pattern

Polymer Film

Etching Resistance

Resist Pattern

Underlying Film

Polysilane

15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7300884 - Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device (2007-11-27),

2. 7235490 - Method of manufacturing semiconductor device (2007-06-26),

3. 7198886 - Method for forming pattern (2007-04-03),

4. 6806021 - Method for forming a pattern and method of manufacturing semiconductor device (2004-10-19),

5. 6762325 - Method for production of alkoxylated compound (2004-07-13),

6. 6576562 - Manufacturing method of semiconductor device using mask pattern having high etching resistance (2003-06-10),

7. 6569595 - Method of forming a pattern (2003-05-27),

8. 6465290 - Method of manufacturing a semiconductor device using a polymer film pattern (2002-10-15),

9. 6420271 - Method of forming a pattern (2002-07-16),

10. 6337163 - Method of forming a pattern by making use of hybrid exposure (2002-01-08),

11. 6270948 - Method of forming pattern (2001-08-07),

12. 6054254 - Composition for underlying film and method of forming a pattern using (2000-04-25),

13. 6025117 - Method of forming a pattern using polysilane (2000-02-15),

14. 5994007 - Pattern forming method utilizing first insulative and then conductive (1999-11-30),

15. 5981150 - Method for forming a resist pattern (1999-11-09),

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Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]