Kumagaya, Japan

Yasufumi Nishii

This inventor holds 21 USPTO granted patents and 5 published patent applications and 12 EPO patents, primarily in Exposure Apparatus. Top assignee: Nikon Corporation. Active years: 2010-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasufumi Nishii. Retrieved from https://idiyas.com/inventor/yasufumi-nishii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 4.8

 

Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 123(Granted Patents)


Company Filing History:


Years Active: 2010-2017

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Areas of Expertise:
Exposure Method
Substrate Stage
Device Manufacturing
Liquid Recovery System
Immersion System
Maintenance Method
Exposure Apparatus
Device Fabricating
21 patents (USPTO):Explore Patents

Title: Innovator Yasufumi Nishii: Advancements in Exposure Apparatus Technology

Introduction: Yasufumi Nishii, based in Kumagaya, Japan, is a prominent inventor known for his significant contributions to the field of exposure apparatus technology. With an impressive portfolio consisting of 21 patents, Nishii has been instrumental in developing innovative solutions aimed at improving device manufacturing processes.

Latest Patents: Nishii's latest patents reflect a deep expertise in exposure methods and apparatus design. One notable patent describes an exposure apparatus that projects a pattern image onto a substrate through a liquid medium. This apparatus integrates a projection optical system that facilitates the accurate projection of images and features a movable member that adjusts relative to the projection system. A liquid-repellent member is also included, enhancing efficiency by preventing liquid interference. Another innovative patent focuses on an exposure method that incorporates a recovery device, designed to retrieve any liquid that may leak from the interface between the substrate and the holding member, thus ensuring the integrity of the manufacturing process.

Career Highlights: Nishii's career is marked by his role at Nikon Corporation, a major player in the imaging and optics industry. His expertise in exposure technology has garnered recognition not only within the company but also in the broader technological community. His numerous patents underscore his commitment to advancing manufacturing technologies.

Collaborations: Throughout his career, Nishii has collaborated with esteemed colleagues such as Hiroyuki Nagasaka and Kenichi Shiraishi. These partnerships have fostered innovative ideas and developments, contributing to the ongoing evolution of exposure apparatus technology.

Conclusion: Yasufumi Nishii stands out as a leading figure in the field of innovative technologies related to exposure apparatus. His extensive patent portfolio and collaborative efforts with talented peers highlight his dedication to driving advancements that significantly impact the manufacturing domain. His work at Nikon Corporation continues to pave the way for future innovations in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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