The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Dec. 08, 2010
Applicants:

Yasufumi Nishii, Kumagaya, JP;

Kenichi Shiraishi, Saitama, JP;

Hirotaka Kohno, Ageo, JP;

Inventors:

Yasufumi Nishii, Kumagaya, JP;

Kenichi Shiraishi, Saitama, JP;

Hirotaka Kohno, Ageo, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract

A stage apparatus PST is provided with a holder PH, which has a substrate holding surfaceA that holds a substrate P; a stage, which supports and moves the holder PH; and a recovery apparatus, which is disposed in the vicinity of the holder PH and has lyophilic partsof which at least a part of each is lyophilic, that uses the lyophilic partsto recover a liquid. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.


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