Yan-Hua Lin

Title: Yan-Hua Lin: Innovator in Semiconductor Technology

Introduction

Yan-Hua Lin is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of Yan-Hua Lin's latest patents is related to a contact silicide having a non-angular profile. This innovation involves a semiconductor device that includes a transistor with a source/drain region. A conductive contact is positioned over the source/drain region, and a silicide element is located beneath the conductive contact. The silicide element features a non-angular cross-sectional profile, which may take on an approximately curved shape, such as an ellipse-like profile. This silicide element is formed by creating an amorphous region in the source/drain region through an implantation process, which can be a cold implantation process.

Career Highlights

Yan-Hua Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Yan-Hua Lin has collaborated with notable colleagues, including Sheng-Wen Chen and Shih Yu-Shen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yan-Hua Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future advancements.