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For the Inventor, By the Inventor

San Jose, CA, United States of America

Xuefeng Liu

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This inventor holds 25 USPTO granted patents and 4 published patent applications and 2 EPO patents, primarily in Optical Metrology. Top assignees: Kla Tencor Corporation, Kla Corporation. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xuefeng Liu. Retrieved from https://idiyas.com/inventor/xuefeng-liu-jizgebkv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 96.0

 

Average Co-Inventor Count = 4.4

ph-index = 6

Forward Citations = 198(Granted Patents)


Company Filing History:

goldMedal16 out of 1,787 
 
Kla Tencor Corporation
 patents
silverMedal9 out of 620 
 
Kla Corporation
 patents

Years Active: 2013-2026

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Areas of Expertise:
Overlay Metrology
Frequency Conversion
Particle Detection
Polarized Infrared Reflectometer
Optical Critical Dimension
Electron Beam Lithography
Nonlinear Crystal Gratings
Metrology Systems
Illumination Subsystems
Sensitive Detection
Field Emitter Array
Semiconductor Wafer
25 patents (USPTO):Explore Patents
1. 12717248 - Off-axis through the lens mutually coherent dark field imaging system with incoherent light for overlay metrology (2026-08-25),
2. 11899338 - Deep ultraviolet laser using strontium tetraborate for frequency conversion (2024-02-13),
3. 11879853 - Continuous degenerate elliptical retarder for sensitive particle detection (2024-01-23),
4. 11815784 - United states frequency conversion using interdigitated nonlinear crystal gratings (2023-11-14),
5. 11567391 - Frequency conversion using interdigitated nonlinear crystal gratings (2023-01-31),
6. 11243175 - Sensitive particle detection with spatially-varying polarization rotator and polarizer (2022-02-08),
7. 11231362 - Multi-environment polarized infrared reflectometer for semiconductor metrology (2022-01-25),
8. 11067389 - Overlay metrology system and method (2021-07-20),
9. 10948423 - Sensitive particle detection with spatially-varying polarization rotator and polarizer (2021-03-16),
10. 10748730 - Photocathode including field emitter array on a silicon substrate with boron layer (2020-08-18),
11. 10558123 - Electron source (2020-02-11),
12. 10325004 - Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology (2019-06-18),
13. 10197501 - Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors (2019-02-05),
14. 10133181 - Electron source (2018-11-20),
15. 9970863 - Optical metrology with reduced focus error sensitivity (2018-05-15),

Title: Xuefeng Liu: Pioneering Inventor from San Jose

Introduction: Xuefeng Liu is a renowned inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Xuefeng Liu holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Xuefeng Liu has worked with leading tech companies, spearheading research and development projects that have led to significant advancements in the industry.

Collaborations: Xuefeng Liu has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Xuefeng Liu's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and creators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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