The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Dec. 12, 2024
Kla Corporation, Milpitas, CA (US);
Wenjian Cai, Sunnyvale, CA (US);
Andrew V. Hill, Berkley, CA (US);
Xuefeng Liu, San Jose, CA (US);
John Fielden, Los Altos, CA (US);
Yung-Ho Alex Chuang, Cupertino, CA (US);
Huimin Ouyang, Mountain View, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system is disclosed. The system includes an incoherent illumination source to generate incoherent illumination. The system includes a diffraction grating to split the incoherent illumination. The system includes an objective lens to direct one or more pairs of mutually coherent illumination beams to a metrology target on a sample and collect sample light associated with diffraction of pairs of mutually coherent illumination beams. The system includes a mask configured to pass a single nonzero-order diffraction beam and block a zero-order diffraction beam associated with each of the mutually coherent illumination beams. The system includes a detector configured to generate an image of the metrology target based on light passed by the mask. The system includes a controller communicatively coupled to the detector, including one or more processors configured to generate one or more metrology measurements of the sample based on the image.