Huimin Ouyang

Title: Huimin Ouyang - Innovator in Metrology Systems

Introduction

Huimin Ouyang is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of metrology through his innovative patent. His work focuses on enhancing measurement systems, which are crucial for various applications in technology and manufacturing.

Latest Patents

Huimin Ouyang holds a patent for an "Off-axis through the lens mutually coherent dark field imaging system with incoherent light for overlay metrology." This metrology system utilizes an incoherent illumination source to generate light, which is then split by a diffraction grating. The system directs mutually coherent illumination beams to a metrology target on a sample, collecting sample light associated with the diffraction of these beams. A mask is included to pass a single nonzero-order diffraction beam while blocking the zero-order diffraction beam. The detector generates an image of the metrology target based on the light passed by the mask, and a controller processes this information to produce metrology measurements of the sample.

Career Highlights

Huimin Ouyang is currently employed at Kla Corporation, a company known for its advanced metrology and inspection solutions. His work at Kla Corporation has allowed him to apply his innovative ideas in practical settings, contributing to the advancement of metrology technologies.

Collaborations

One of Huimin Ouyang's notable collaborators is Wenjian Cai, who is also involved in the field of metrology. Their partnership exemplifies the collaborative spirit in research and innovation, leading to advancements in measurement technologies.

Conclusion

Huimin Ouyang's contributions to metrology through his innovative patent highlight his role as a significant inventor in the field. His work continues to influence the development of advanced measurement systems, showcasing the importance of innovation in technology.