Company Filing History:
8 out of 3,086 
1 out of 832,680 Years Active: 2002-2023
Title: Xiaoming Xie: Innovator in Two-Dimensional Materials
Introduction
Xiaoming Xie is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the development of two-dimensional materials. With a total of 9 patents to his name, Xie's work is paving the way for advancements in various technological applications.
Latest Patents
Xie's latest patents include innovative methods for preparing multi-layer hexagonal boron nitride film and adjusting the boundary of graphene. The method for preparing a multi-layer hexagonal boron nitride film involves several steps, including preparing a substrate and a boron-containing solid catalyst. This process allows for the creation of a hexagonal boron nitride film with a lateral size in the order of inches and a thickness ranging from several nanometers to several hundred nanometers. This advancement provides a favorable basis for the application of hexagonal boron nitride in two-dimensional material devices.
Another notable patent is the method for adjusting and controlling the boundary of graphene. This method includes providing an insulating substrate and feeding a carbon source gas into a growth chamber. By controlling the flow rate of the first reaction gas, the invention enables the controllability of the graphene boundary, allowing for continuous growth and modification of the graphene structure.
Career Highlights
Xiaoming Xie has worked at the Chinese Academy of Sciences, where he has been involved in groundbreaking research and development. His work has significantly impacted the field of materials science, particularly in the area of two-dimensional materials.
Collaborations
Xie has collaborated with notable colleagues, including Haomin Wang and Mianheng Jiang. These collaborations have further enhanced his research and contributions to the field.
Conclusion
Xiaoming Xie's innovative work in the field of two-dimensional materials, particularly through his patents, showcases his expertise and dedication to advancing technology. His contributions are essential for the future of materials science and its applications.
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