The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Jun. 04, 2015
Applicant:

Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Tianru Wu, Shanghai, CN;

Xuefu Zhang, Shanghai, CN;

Guangyuan Lu, Shanghai, CN;

Chao Yang, Shanghai, CN;

Haomin Wang, Shanghai, CN;

Xiaoming Xie, Shanghai, CN;

Mianheng Jiang, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/00 (2006.01); C30B 25/18 (2006.01); C23C 16/26 (2006.01); C30B 29/02 (2006.01); C23C 14/16 (2006.01); C23C 14/35 (2006.01); C23C 14/58 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01); C23F 17/00 (2006.01); C25D 5/50 (2006.01); C25F 3/22 (2006.01); C30B 25/12 (2006.01); C30B 25/16 (2006.01); C25D 5/34 (2006.01); C25D 7/06 (2006.01); C01B 32/186 (2017.01); C22F 1/08 (2006.01); C25D 3/12 (2006.01);
U.S. Cl.
CPC ...
C30B 25/186 (2013.01); C01B 32/186 (2017.08); C23C 14/165 (2013.01); C23C 14/35 (2013.01); C23C 14/5806 (2013.01); C23C 16/0227 (2013.01); C23C 16/0281 (2013.01); C23C 16/26 (2013.01); C23C 16/455 (2013.01); C23F 17/00 (2013.01); C25D 5/34 (2013.01); C25D 5/50 (2013.01); C25D 7/0614 (2013.01); C25F 3/22 (2013.01); C30B 25/12 (2013.01); C30B 25/165 (2013.01); C30B 25/183 (2013.01); C30B 29/02 (2013.01); C22F 1/08 (2013.01); C25D 3/12 (2013.01);
Abstract

The present disclosure provides a local carbon-supply device and a method for preparing a wafer-level graphene single crystal by local carbon supply. The method includes: providing the local carbon-supply device; preparing a nickel-copper alloy substrate, placing the nickel-copper alloy substrate in the local carbon-supply device; placing the local carbon-supply device provided with the nickel-copper alloy substrate in a chamber of a chemical vapor-phase deposition system, and introducing a gaseous carbon source into the local carbon-supply device to grow the graphene single crystal on the nickel-copper alloy substrate. A graphene prepared by embodiments of the present disclosure has the advantages of good crystallinity of a crystal domain, simple preparation condition, low cost, a wider window of condition parameters required for growth, and good repeatability, which lays a foundation for wide application of the wafer-level graphene single crystal in a graphene apparatus and other fields.


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