Xiaoliang Jin

Title: Innovations of Xiaoliang Jin in CVD Technology

Introduction

Xiaoliang Jin is a prominent inventor based in San Jose, CA, known for his contributions to the field of chemical vapor deposition (CVD) technology. With a total of 7 patents to his name, Jin has made significant advancements that enhance the efficiency and effectiveness of thin film deposition processes.

Latest Patents

Among his latest patents is the "Reciprocating rotary CVD equipment and application method." This innovative apparatus includes a cavity, a wafer heating base, and a rotating apparatus designed to improve the uniformity of thin film deposition across the circumferential direction of a wafer. The rotating apparatus features a rotating power mechanism and a rotating sealing mechanism, which work together to facilitate the reciprocating rotation of the wafer heating base. Another notable patent is focused on "Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposition chamber." This method describes the fabrication of silicon comprising films on a substrate using hexachlorodisilane as a reactant under controlled pressure conditions.

Career Highlights

Xiaoliang Jin has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Jin has collaborated with notable professionals such as Jun Zhao and Lee Luo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Xiaoliang Jin's work in CVD technology exemplifies the impact of innovative thinking in the semiconductor industry. His patents and career achievements highlight his commitment to advancing technology and improving manufacturing processes.