Hsinchu County, Taiwan

Xiao-Meng Chen


Average Co-Inventor Count = 4.8

ph-index = 3

Forward Citations = 43(Granted Patents)


Location History:

  • Hsinchu, TW (2015)
  • Baoshan Township, TW (2016)
  • Hsinchu County, TW (2015 - 2020)

Company Filing History:


Years Active: 2015-2020

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4 patents (USPTO):

Title: The Innovative Contributions of Inventor Xiao-Meng Chen

Introduction

Xiao-Meng Chen is a prominent inventor based in Hsinchu County, Taiwan, recognized for his contributions to the field of semiconductor technology. With a total of four patents to his name, Chen has made significant strides in developing advanced methods and mechanisms that enhance hybrid bonding processes in semiconductors.

Latest Patents

Among his latest patents, two notable inventions stand out. The first patent, titled "Mechanisms for Cleaning Substrate Surface for Hybrid Bonding," introduces a novel method for cleaning the surface of semiconductor wafers intended for hybrid bonding. This technique involves a plasma process followed by a cleaning procedure that creates metal-hydrogen bonds, ensuring optimal bonding conditions.

The second patent, "Plasma-Processing Apparatus with Upper Electrode Plate and Method for Performing Plasma Treatment Process," outlines a sophisticated plasma-processing apparatus designed to improve the efficiency of plasma treatment processes. This apparatus features an upper electrode plate with specialized gas holes and a protective layer, showcasing Chen's commitment to enhancing semiconductor fabrication.

Career Highlights

Xiao-Meng Chen's career is marked by his association with Taiwan Semiconductor Manufacturing Company Limited, where he has been pivotal in driving innovation. His ingenuity and technical acumen have positioned him as a key player in the evolution of semiconductor technologies, especially in processes related to hybrid bonding.

Collaborations

Collaboration has been a critical aspect of Chen's work. He has closely worked with notable colleagues, including Chia-Shiung Tsai and Sheng-Chau Chen, fostering an environment of shared knowledge and innovation. Through these collaborations, they have collectively contributed to the advancement of semiconductor manufacturing techniques.

Conclusion

In conclusion, Xiao-Meng Chen's inventive spirit and dedication to semiconductor technology continue to open new avenues for innovation. His patents not only demonstrate his expertise and creativity but also capture the essence of progress in semiconductor fabrication. As the industry evolves, the impact of Chen's contributions will undoubtedly play a pivotal role in shaping the future of technology.

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