Wu-Hung Ko

Title: Innovations of Wu-Hung Ko

Introduction

Wu-Hung Ko is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods for cleaning photomasks and forming semiconductor structures.

Latest Patents

Wu-Hung Ko's latest patents include a cleaning method and a method for forming a semiconductor structure. One of his notable inventions is a method for cleaning a reflective photomask. This method involves placing a photomask in a first chamber and performing a dry cleaning operation. The dry cleaning operation includes providing hydrogen radicals to the first chamber, generating hydrocarbon gases as a result of reactions of the hydrogen radicals, and removing the hydrocarbon gases from the first chamber. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Wu-Hung Ko is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His role at this leading semiconductor manufacturer allows him to apply his expertise in developing advanced technologies that drive the industry forward.

Collaborations

Some of his notable coworkers include Chih-Wei Wen and Chung-Hung Lin. Their collaborative efforts contribute to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Wu-Hung Ko's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the field. His innovative methods for cleaning photomasks and forming semiconductor structures are paving the way for advancements in the industry.