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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11809076 B1

PDFFull Text
Date of Patent:
Nov. 07, 2023

Filed:

May. 27, 2022

Cleaning method, method for forming semiconductor structure and system thereof

Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Wu-Hung Ko, Tainan, TW;

Chung-Hung Lin, Tainan, TW;

Chih-Wei Wen, Tainan, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;

Attorneys:

WPAT LAW

Anthony King

Primary Examiner:

Hung V Nguyen

Int. Cl.
CPC ...
G03F 1/82 (2012.01); H01L 21/67 (2006.01); G03F 7/00 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); B08B 7/0035 (2013.01); B08B 7/0071 (2013.01); G03F 7/70033 (2013.01); G03F 7/70733 (2013.01); G03F 7/70925 (2013.01); H01L 21/67028 (2013.01); H01L 21/67225 (2013.01);
Abstract

A method for cleaning a reflective photomask, a method of manufacturing a semiconductor structure, and a system for forming a semiconductor structure are provided. The method for cleaning a reflective photomask includes placing a photomask in a first chamber, and performing a dry cleaning operation on the photomask in the first chamber, wherein the dry cleaning operation includes providing hydrogen radicals to the first chamber, generating hydrocarbon gases as a result of reactions of the hydrogen radicals, and removing the hydrocarbon gases from the first chamber.

Find Patent Forward Citations

Ko, Wu-Hung. (2023). Cleaning method, method for forming semiconductor structure and system thereof (U.S. Patent No. 11809076). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11809076

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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