The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Feb. 22, 2018
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/44 (2012.01); G03F 1/54 (2012.01); G03F 1/46 (2012.01); G03F 1/62 (2012.01); G03F 1/32 (2012.01); G03F 1/84 (2012.01); G03F 1/64 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/44 (2013.01); G03F 1/32 (2013.01); G03F 1/46 (2013.01); G03F 1/54 (2013.01); G03F 1/62 (2013.01); G03F 1/64 (2013.01); G03F 1/84 (2013.01); G03F 7/70983 (2013.01);
Abstract
A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.