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For the Inventor, By the Inventor

Yongin, South Korea

Woo-Gwan Shim

This inventor holds 27 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Samsung Electronics Co., Ltd., Semes Co., Ltd., Pukyong National University. Active years: 2006-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woo-Gwan Shim. Retrieved from https://idiyas.com/inventor/woo-gwan-shim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 70.4

Average Co-Inventor Count = 5.5

ph-index = 5

Forward Citations = 80(Granted Patents)


Location History:

  • Yongin, KR (2008)
  • Gyeonggi-do, KR (2006 - 2009)
  • Yongin-si, KR (2006 - 2023)

Company Filing History:

goldMedal27 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal2 out of 802 
 
Semes Co., Ltd.
 patents
bronzeMedal1 out of 120 
 
Pukyong National University
 patents
where one patent can have more than one assignee

Years Active: 2006-2023

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Areas of Expertise:
Substrate Processing
Etching Methods
Integrated Circuit Capacitors
Supercritical Fluid
Silicon Surface Cleaning
Transistor Fabrication
Metal Nitride Layer
Capacitor Manufacturing
Semiconductor Memory Devices
Drying Apparatus
27 patents (USPTO):Explore Patents
1. 11664243 - Substrate processing apparatus (2023-05-30),
2. 11361960 - Substrate processing apparatus and substrate processing system including the same (2022-06-14),
3. 10707071 - Substrate processing apparatus and substrate processing system including the same (2020-07-07),
4. 8790470 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2014-07-29),
5. 8766343 - Integrated circuit capacitors having sidewall supports (2014-07-01),
6. 8637942 - Transistor having a metal nitride layer pattern, etchant and methods of forming the same (2014-01-28),
7. 8585917 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2013-11-19),
8. 8119476 - Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby (2012-02-21),
9. 8084367 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2011-12-27),
10. 8058180 - Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture (2011-11-15),
11. 7985999 - Semiconductor device having capacitor (2011-07-26),
12. 7879735 - Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same (2011-02-01),
13. 7825030 - Method of forming a spacer (2010-11-02),
14. 7820508 - Semiconductor device having capacitor and method of fabricating the same (2010-10-26),
15. 7745338 - Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the same (2010-06-29),

Title: Innovations by Woo-Gwan Shim: A Leader in Substrate Processing Technologies

Introduction

Woo-Gwan Shim, located in Yongin-si, South Korea, has made significant strides in the field of substrate processing, holding an impressive portfolio of 27 patents. His innovative approaches contribute greatly to advancements in manufacturing technologies.

Latest Patents

Among his latest patents, Woo-Gwan Shim has developed a substrate processing apparatus that includes a spin chuck for rotating the substrate and various nozzles for applying chemical liquids and deionized water. Additionally, he introduced a laser device capable of emitting a pulsed laser beam for the precise etching of substrate edges. Another notable patent involves a substrate processing apparatus and system that incorporates chambers and dual substrate supports, allowing the efficient application of supercritical fluids for enhanced processing capabilities.

Career Highlights

Woo-Gwan Shim has had a distinguished career, contributing his expertise to esteemed companies such as Samsung Electronics Co., Ltd. and Semes Co., Ltd. His contributions have led to advancements in technologies that are pivotal to the evolution of the electronics manufacturing sector.

Collaborations

Throughout his career, Woo-Gwan has collaborated with talented peers, including Chang-ki Hong and Jeong-Nam Han. These partnerships have fostered a collaborative environment that promotes innovative thinking and the development of cutting-edge technologies.

Conclusion

Woo-Gwan Shim’s contributions to substrate processing technology demonstrate his commitment to innovation. His patents reflect not only his expertise but also his dedication to pushing the boundaries of what is possible in the industry. As the field continues to evolve, innovators like Woo-Gwan play a crucial role in shaping its future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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