Princeton, NJ, United States of America

Winston Kong Chan

This inventor holds 21 USPTO granted patents and 2 published patent applications. Top assignees: Sri International, Sarnoff Corporation, University of Iowa Research Foundation. Active years: 2003-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Winston Kong Chan. Retrieved from https://idiyas.com/inventor/winston-kong-chan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 66.7

Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 182(Granted Patents)


Location History:

  • Menlo Park, CA (US) (2020)
  • Princeton, NJ (US) (2003 - 2023)

Company Filing History:


Years Active: 2003-2026

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21 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Winston Kong Chan: A Pioneer in Photodiode Technology**

Introduction

Winston Kong Chan, a noted inventor based in Princeton, NJ, has made significant advancements in the field of semiconductor technology. With a remarkable portfolio of 19 patents, Chan's work primarily revolves around enhancing photodiode performance and integrating innovative materials to improve electronic devices.

Latest Patents

Among Chan's latest inventions is a groundbreaking photodiode design aimed at eliminating excess noise. This innovation leverages a superlattice multiplication region to selectively allow either electrons or holes to accumulate energy for impact ionization. The resulting design includes a lattice matched pair of distinct semiconductor alloys, along with an absorber region and a semiconductor substrate. This cutting-edge approach provides a flexible range of wavelength cutoffs from 1.7 to 4.9 μm while maintaining exceptionally low noise levels, enhancing the accuracy of electromagnetic radiation signal detection.

Additionally, his patent on using a compliant layer to eliminate bump bonding details a method for building CMOS-compatible substrates. This invention consists of multiple stacks of semiconductor layers, with a tellurium-based semiconductor layer on top of a porous silicon layer, which allows for the accommodation of structural defects. This innovative method highlights Chan’s commitment to advancing semiconductor applications in modern technology.

Career Highlights

Winston Kong Chan has an impressive background, having contributed to esteemed organizations such as SRI International and Sarnoff Corporation. His work at these institutions has played a pivotal role in the development of advanced technologies in the semiconductor field, enhancing both theoretical and practical applications.

Collaborations

Throughout his career, Chan has had the opportunity to work alongside talented professionals, including Joseph H. Abeles and Martin Kwakernaak. These collaborations have fostered an environment of innovation, allowing for the exchange of ideas that drive forward the boundaries of current technology.

Conclusion

Winston Kong Chan stands out as an exceptional inventor whose contributions have significantly advanced the field of photodiode technology and semiconductor materials. With his extensive patent portfolio and collaborations with key figures in the industry, Chan continues to demonstrate the profound impact that innovative engineering can have on technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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