This inventor holds 8 USPTO granted patents and 1 published patent application. Top assignees: Mentor Graphics Corporation, Other. Active years: 2009-2018.
Company Filing History:
7 out of 672 
1 out of 834,350 Years Active: 2009-2018
Title: The Innovative Contributions of William S. Graupp
Introduction
William S. Graupp, based in Aurora, OR, is a notable inventor recognized for his significant contributions to the field of circuit design and photolithography. With a total of eight patents to his name, Graupp has demonstrated a consistent ability to innovate and improve existing technologies.
Latest Patents
Among his latest patents, Graupp has developed two key inventions. The first, titled "Hierarchical fill in a design layout," discloses a computing system that implements tools to capture the hierarchy of a circuit design layout. This layout hierarchy includes multiple cells that identify portions of the design, allowing further modifications separate from other sections of the layout. The second patent, "Analysis optimizer," details a method for preparing target layout data for photolithographic-friendly design analysis. This method involves revising target layout data by removing specific features to ensure that the remaining features will print correctly on a wafer.
Career Highlights
Graupp has had an impactful career, including work at Mentor Graphics Corporation, where he contributed to various innovative projects. His experience in this company has bolstered his expertise in circuit design and photolithographic processes, making a significant impact on the development of advanced electronics.
Collaborations
Throughout his career, Graupp has collaborated with esteemed professionals in the field, including Jean-Marie Brunet and Juan Andres Torres Robles. These partnerships have allowed for the exchange of ideas and expertise, leading to improved methodologies in design and analysis within his patented projects.
Conclusion
William S. Graupp stands out as a prominent inventor in the electronic design industry, with a track record of successful patents and collaborations. His work remains influential in the ongoing evolution of circuit design and photolithography, showcasing the vital role of innovation in technological advancements.