The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Nov. 07, 2011
Juan Andres Torres Robles, Wilsonville, OR (US);
William S. Graupp, Aurora, OR (US);
Mark C. Simmons, Wilsonville, OR (US);
Juan Andres Torres Robles, Wilsonville, OR (US);
William S. Graupp, Aurora, OR (US);
Mark C. Simmons, Wilsonville, OR (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.