Mark C Simmons

Title: Mark C Simmons: Innovator in Photolithographic Techniques

Introduction

Mark C Simmons is a notable inventor based in Wilsonville, OR (US). He has made significant contributions to the field of photolithography, holding a total of 8 patents. His work focuses on optimizing processes that are crucial for the semiconductor manufacturing industry.

Latest Patents

One of his latest patents is titled "Analysis Optimizer." This invention describes a method for preparing a set of target layout data for photolithographic friendly design (LFD) analysis. The method involves revising the target layout data to eliminate areas or features that are not essential for the analysis. Features that are determined to print correctly, duplicate features, and those insensitive to variations in process conditions are removed. The revised target layout is then analyzed to ensure that the remaining features will print correctly on a wafer.

Another significant patent is "Pattern Matching Optical Proximity Correction." This invention relates to techniques that enhance the speed and consistency of Optical Proximity Correction (OPC) processes through pattern matching. The process involves analyzing a layout design to identify arrays of identical layout patterns that match a reference pattern. These arrays are then divided into core and boundary portions, allowing for the application of OPC process information to the core portions while using conventional methods for the boundary portions.

Career Highlights

Throughout his career, Mark has worked with various companies, including Mentor Graphics Corporation. His expertise in photolithography has positioned him as a key player in the development of innovative solutions in this field.

Collaborations

Mark has collaborated with several professionals, including Juan Andres Torres Robles and William S Graupp. These collaborations have contributed to the advancement of his inventions and the overall progress in photolithographic techniques.

Conclusion

Mark C Simmons is a distinguished inventor whose work in photolithography has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to improving semiconductor manufacturing processes.