Mentor Graphics Corporation

Other

Mark C Simmons

Juan Andres Torres Robles

William S Graupp

George P Lippincott

Andrew Michael Jost

Oberdan Otto

A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.

Analysis optimizer

Aspects of the invention relate to techniques for improving speed and consistency of OPC processes based on pattern matching. Pattern matching may be performed on a layout design to determine one or more arrays in the layout design that comprise arrays of identical layout patterns of which each matches a reference pattern. The one or more arrays may then be partitioned into core portions and boundary portions. The OPC process information for the reference pattern may be applied to the core portions, while a conventional OPC process may be performed on the boundary portions and layout regions outside of the one or more arrays.

Pattern matching optical proximity correction

Aspects of the invention relate to pattern matching of layout design data. Layout design data is searched to identify configurations of geometric elements that match a reference pattern based on an anchor edge in the reference pattern. An edge in a search window area matching the anchor edge may first be selected as anchor matching edge. A search portion of the reference pattern is then compared with the region of the search window area corresponding to the selected anchor matching edge.

Fast pattern matching

A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.

Pre-bias optical proximity correction

The pry tool of the present invention is utilized for dislodging concrete forms from set concrete. It includes a fulcrum assembly and pivoting leveraging member in operative juxtaposition to the fulcrum assembly. One end of the fulcrum assembly engages a first single concrete form member connecting slot and the opposite end of the fulcrum assembly connects to a pivoting leveraging member. The leveraging member is parallel and set off from the fulcrum assembly in direct alignment with a second adjacent concrete form. The leveraging member is hand manipulated to exert force against the second adjacent concrete form forcing the form inward into the concrete wall. This causes a leveraging action with the engaged end of the fulcrum assembly forcing the first concrete form outward away from the concrete wall and thereby separating the form from the wall.

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Wilsonville, OR, United States of America

Mark C Simmons