Haverhill, MA, United States of America

William Leavitt


Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Haverhill, MA (US) (2000 - 2017)
  • Haverill, MA (US) (2018)

Company Filing History:


Years Active: 2000-2018

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovations of William Leavitt

Introduction

William Leavitt is a notable inventor based in Haverhill, MA (US), recognized for his contributions to the field of ion beam technology. With a total of nine patents to his name, Leavitt has made significant advancements that enhance the stability and efficiency of ion extraction systems.

Latest Patents

Leavitt's latest patents include a source housing assembly for controlling ion beam extraction stability and ion beam current. This invention provides approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. The source housing assembly includes a source housing surrounding an ion source with an arc chamber, featuring an extraction aperture plate mounted at its proximal end. Additionally, a vacuum liner is disposed within the source housing to form a barrier around a set of vacuum pumping apertures. This configuration ensures that only ions produced within the arc chamber exit through the extraction aperture plate, effectively containing extraneous ions. Another significant patent focuses on controlling an ion beam in a wide beam current operation range. This invention involves an ion implantation system that includes an ion source for generating an ion beam and a terminal suppression electrode. The system is designed to conduct the ion beam through an aperture while applying a potential from a voltage supply, allowing for increased beam current operation range.

Career Highlights

Throughout his career, William Leavitt has worked with prominent companies such as Varian Semiconductor Equipment Associates, Inc. and Ibis Technology Corporation. His work in these organizations has contributed to the development of advanced technologies in the semiconductor and ion beam industries.

Collaborations

Leavitt has collaborated with notable individuals in his field, including Steven Richards and Shengwu Chang. These partnerships have likely fostered innovation and the exchange of ideas, further enhancing the impact of his work.

Conclusion

William Leavitt's contributions to ion beam technology through his patents and career achievements highlight his role as a significant inventor in the field. His innovative approaches continue to influence advancements in ion extraction systems and ion implantation technologies.

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