Company Filing History:

21 out of 4,883

Asml Netherlands B.v.

patents

2 out of 14,087

U.S. Philips Corporation

patents

Years Active: 1988-2018

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23 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9958788 - Method of operating a patterning device and lithographic apparatus (2018-05-01),

2. 9658541 - Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate (2017-05-23),

3. 9568833 - Method of operating a patterning device and lithographic apparatus (2017-02-14),

4. 9417533 - Method of operating a patterning device and lithographic apparatus (2016-08-16),

5. 8773637 - Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark (2014-07-08),

6. 8675210 - Level sensor, lithographic apparatus, and substrate surface positioning method (2014-03-18),

7. 8279396 - Lithographic apparatus and device manufacturing method (2012-10-02),

8. 7830493 - System and method for compensating for radiation induced thermal distortions in a substrate or projection system (2010-11-09),

9. 7671319 - Lithographic apparatus, device manufacturing method and energy sensor (2010-03-02),

10. 7595496 - Optimized correction of wafer thermal deformations in a lithographic process (2009-09-29),

11. 7528933 - Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement (2009-05-05),

12. 7477772 - Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression (2009-01-13),

13. 7460309 - Variable lens and exposure system (2008-12-02),

14. 7391676 - Ultrasonic distance sensors (2008-06-24),

15. 7391503 - System and method for compensating for thermal expansion of lithography apparatus or substrate (2008-06-24),

Sure, I will proceed with crafting an article about inventor Willem Jurrianus Venema for you. Let's get started.

Title: Willem Jurrianus Venema: A Trailblazer in Innovation

Introduction:

Willem Jurrianus Venema, a visionary inventor hailing from Eindhoven, Netherlands, has left an indelible mark on the world of technology with his relentless pursuit of innovation. With 23 patents to his name and a steadfast dedication to pushing the boundaries of what is possible, Venema stands out as a true trailblazer in the realm of inventions.

Latest Patents:

Among his latest patents is the groundbreaking "Method of operating a patterning device and lithographic apparatus," wherein a lithographic reticle is illuminated to transfer a pattern to a substrate while effectively managing distortions induced by heating. By utilizing reference marks and sophisticated calculations, Venema's method paves the way for enhanced precision and efficiency in the manufacturing process.

Career Highlights:

Venema's illustrious career has seen him make significant contributions to companies such as ASML Netherlands B.V. and U.S. Philips Corporation. His innovative spirit and technical expertise have been instrumental in advancing the field of lithography and semiconductor manufacturing.

Collaborations:

Throughout his career, Venema has collaborated closely with esteemed colleagues such as Vitaliy Prosyentsov and Kars Zeger Troost. Their combined efforts have led to the development of cutting-edge technologies and solutions that have reshaped the industry landscape.

Conclusion:

In conclusion, Willem Jurrianus Venema's unwavering commitment to innovation and his remarkable contributions to the world of inventions continue to inspire generations of inventors. His pioneering work serves as a testament to the power of creativity, determination, and ingenuity in driving progress and shaping the future of technology.

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