The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Oct. 25, 2005
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.