The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Apr. 25, 2007
Applicant:
Willem J. Venema, Eindhoven, NL;
Inventor:
Willem J. Venema, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithography apparatus comprising variable lenses is described. These variable lenses are included in a microlens array. At least some of the lenses have two or more immiscible liquids whose optical properties can be varied, for example, by an application of a voltage.
Venema, Willem. (2008). Variable lens and exposure system (U.S. Patent No. 7460309). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7460309
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile