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For the Inventor, By the Inventor

Cornwall, NY, United States of America

Willard E Conley

This inventor holds 20 USPTO granted patents, primarily in Semiconductor Lithography. Top assignees: International Business Machines Corporation, Freescale Semiconductor,inc., Freescale Semiconductors Inc.. Active years: 1989-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Willard E Conley. Retrieved from https://idiyas.com/inventor/willard-e-conley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20

% Patents Active = 75.0

Average Co-Inventor Count = 4.2

ph-index = 8

Forward Citations = 228(Granted Patents)


Location History:

  • Cornwall, NY (US) (1989 - 2001)
  • San Jose, CA (US) (2001)
  • Schenectady, NY (US) (2011 - 2013)
  • Austin, TX (US) (2010 - 2016)

Company Filing History:

goldMedal15 out of 166,425 
 
International Business Machines Corporation
 patents
silverMedal4 out of 5,491 
 
Freescale Semiconductor,inc.
 patents
bronzeMedal1 out of 29 
 
Freescale Semiconductors Inc.
 patents
4. 2 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1989-2016

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Areas of Expertise:
Integrated Circuit
Degradation Monitoring
Multi-Exposure Lithography
Negative Photoresist
Pitch Reduction
Chemically Amplified Resists
Microlithographic Structures
Positive Resist Composition
Dry Developable Photoresist
Aqueous Developable Resists
Thermally Stable Photoresists
Polyimide Formulation
20 patents (USPTO):Explore Patents
1. 9229051 - Integrated circuit with degradation monitoring (2016-01-05),
2. 8507187 - Multi-exposure lithography employing a single anti-reflective coating layer (2013-08-13),
3. 8119334 - Method of making a semiconductor device using negative photoresist (2012-02-21),
4. 7883829 - Lithography for pitch reduction (2011-02-08),
5. 7741221 - Method of forming a semiconductor device having dummy features (2010-06-22),
6. 6300035 - Chemically amplified positive photoresists (2001-10-09),
7. 6207353 - Resist formulation which minimizes blistering during etching (2001-03-27),
8. 5795701 - Making of microlithographic structures with an underlayer film (1998-08-18),
9. 5783361 - Microlithographic structure with an underlayer film containing a (1998-07-21),
10. 5663036 - Microlithographic structure with an underlayer film comprising a (1997-09-02),
11. 5644038 - Quinone diazo compound containing non-metallic atom (1997-07-01),
12. 5567569 - Process for producing a positive pattern utilizing naphtho quinone (1996-10-22),
13. 5552256 - Positive resist composition containing naphthoquinonediazide compound (1996-09-03),
14. 5322765 - Dry developable photoresist compositions and method for use thereof (1994-06-21),
15. 5296332 - Crosslinkable aqueous developable photoresist compositions and method (1994-03-22),

Title: Willard E Conley: Innovator in Integrated Circuits and Lithography

Introduction

Willard E Conley, based in Cornwall, NY, is a prolific inventor with a remarkable portfolio that includes 20 patents. His contributions to the fields of integrated circuits and lithography showcase his innovative spirit and technical expertise.

Latest Patents

Among his latest patents, Conley has developed an integrated circuit with degradation monitoring, which includes a degradation monitoring circuit that features a comparison circuit and sampling circuit designed to improve data signal reliability. This innovation is crucial for enhancing the performance of integrated circuits in various applications. Another significant patent is based on multi-exposure lithography employing a single anti-reflective coating layer. This method involves applying and lithographically patterning a first photoresist over an optically dense layer, ultimately allowing the formation of intricate sublithographic patterns.

Career Highlights

Willard E Conley's professional journey includes impactful roles at renowned organizations such as IBM and Freescale Semiconductor. His work in these companies has significantly influenced the development of advanced semiconductor technologies and fabrication processes.

Collaborations

Conley has worked alongside notable colleagues such as William R Brunsvold and Wayne Martin Moreau. Their collaborative efforts have contributed to the success of various projects and technological advancements in their respective fields.

Conclusion

Willard E Conley's dedication to innovation and his extensive experience in integrated circuit design and lithography have positioned him as a distinguished figure in the tech industry. His 20 patents exemplify his commitment to advancing technology and addressing modern challenges in electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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