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For the Inventor, By the Inventor

Palo Alto, CA, United States of America

Wilbur C Krusell

This inventor holds 35 USPTO granted patents, primarily in Semiconductor Polishing. Top assignees: Lam Research Corporation, Ontrak Systems, Inc., Genus, Inc.. Active years: 1994-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wilbur C Krusell. Retrieved from https://idiyas.com/inventor/wilbur-c-krusell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35

% Patents Active = 88.6

Average Co-Inventor Count = 3.9

ph-index = 17

Forward Citations = 890(Granted Patents)


Location History:

  • San Jose, CA (US) (1994 - 2002)
  • Incline Village, NV (US) (2002 - 2004)
  • Palo Alto, CA (US) (1999 - 2005)

Company Filing History:

goldMedal25 out of 3,940 
 
Lam Research Corporation
 patents
silverMedal8 out of 34 
 
Ontrak Systems, Inc.
 patents
bronzeMedal1 out of 76 
 
Genus, Inc.
 patents
4. 1 out of 56,290 
 
Intel Corporation
 patents
5. 1 out of 77 
 
Watkins- Johnson Company
 patents
where one patent can have more than one assignee

Years Active: 1994-2005

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Areas of Expertise:
Chemical Mechanical Polishing
Wafer Cleaning
Substrate Cleaning
Polishing Apparatus
Thickness Monitoring
Endpoint Detection
Copper Film Polishing
Wafer Transport
Megasonic Bath
Drip Chemical Delivery
Organic Preclean
Zeta Potential
35 patents (USPTO):Explore Patents
1. 6927198 - Methods and apparatus for cleaning semiconductor substrates after polishing of copper film (2005-08-09),
2. 6746320 - Linear reciprocating disposable belt polishing method and apparatus (2004-06-08),
3. 6656025 - Integrated pad and belt for chemical mechanical polishing (2003-12-02),
4. 6621584 - Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing (2003-09-16),
5. 6616772 - Methods for wafer proximity cleaning and drying (2003-09-09),
6. 6594847 - Single wafer residue, thin film removal and clean (2003-07-22),
7. 6517418 - Method of transporting a semiconductor wafer in a wafer polishing system (2003-02-11),
8. 6500056 - Linear reciprocating disposable belt polishing method and apparatus (2002-12-31),
9. 6488040 - Capillary proximity heads for single wafer cleaning and drying (2002-12-03),
10. 6479443 - Cleaning solution and method for cleaning semiconductor substrates after polishing of copper film (2002-11-12),
11. 6428394 - Method and apparatus for chemical mechanical planarization and polishing of semiconductor wafers using a continuous polishing member feed (2002-08-06),
12. 6336845 - Method and apparatus for polishing semiconductor wafers (2002-01-08),
13. 6334229 - Apparatus for cleaning edges of contaminated substrates (2002-01-01),
14. 6328642 - Integrated pad and belt for chemical mechanical polishing (2001-12-11),
15. 6325706 - Use of zeta potential during chemical mechanical polishing for end point detection (2001-12-04),

Title: Innovations by Wilbur C Krusell in Semiconductor Technologies

Introduction

Wilbur C Krusell, based in Palo Alto, CA, is a distinguished innovator with a remarkable portfolio of 35 patents. His contributions primarily focus on advancements in semiconductor technologies, particularly in the cleaning and planarization processes integral to semiconductor manufacturing.

Latest Patents

Among his latest innovations are two notable patents. The first, "Methods and apparatus for cleaning semiconductor substrates after polishing of copper film," introduces a cleaning solution and method that utilizes deionized water, an organic compound, and a fluoride compound in an acidic pH environment. This novel approach significantly enhances the cleaning efficiency of semiconductor substrates post-polishing, effectively addressing issues related to brush loading and contamination.

The second patent, "Linear reciprocating disposable belt polishing method and apparatus," describes an innovative apparatus for chemically mechanically planarizing semiconductor wafers. This invention features a continuous polishing strip with a fixed abrasive surface, supported by a system of drive rollers and support rollers, allowing for bi-directional movement. This design optimizes the planarization process of wafers, enhancing the overall performance in semiconductor manufacturing.

Career Highlights

Wilbur has had a commendable career, contributing his expertise to notable companies such as Lam Research Corporation and Ontrak Systems, Inc. His work in these corporations has significantly impacted the semiconductor industry, driving innovations that improve manufacturing processes.

Collaborations

Throughout his career, Wilbur has collaborated with talented individuals, including coworkers Rahul Jairath and Erik H Engdahl. Their collective expertise has played a crucial role in fostering an environment of creativity and innovation, leading to the development of cutting-edge technologies in semiconductor processing.

Conclusion

Wilbur C Krusell's inventive spirit and dedication to the field of semiconductor technology exemplify the impact of innovation in improving manufacturing processes. His patents not only address current challenges but also pave the way for future advancements, ensuring continued growth in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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