Suwon-si, South Korea

Weonmook Lee

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.1

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Suwon, KR (2012 - 2014)
  • Suwon-Si, KR (2012 - 2014)

Company Filing History:


Years Active: 2012-2014

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4 patents (USPTO):Explore Patents

Title: Weonmook Lee: Innovator in Plasma Technology

Introduction

Weonmook Lee is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma technology, holding a total of four patents. His innovative work focuses on enhancing the efficiency and functionality of plasma chemical reactors.

Latest Patents

One of his latest patents is the Plasma Chemical Reactor. This invention includes a chamber designed to provide a plasma reaction space. It features a cathode assembly that is coupled to one side of the chamber's wall surface, supporting a substrate positioned at the center inside the chamber. The design allows for height adjustment, ensuring that the substrate maintains a horizontal state during operation. Another significant patent is the Side Gas Injector for Plasma Reaction Chamber. This device includes a circular distribution plate and a cover plate. The circular distribution plate is equipped with an injection hole for introducing a reaction gas and a distribution channel that allows the gas to be jetted radially in multiple positions along the inner circumference of the plate.

Career Highlights

Weonmook Lee is currently employed at DMS Co., Ltd., where he continues to develop innovative technologies in plasma applications. His work has been instrumental in advancing the capabilities of plasma reactors, making them more efficient and versatile.

Collaborations

He collaborates with talented coworkers, including Hwankook Chae and Kunjoo Park, who contribute to the innovative environment at DMS Co., Ltd.

Conclusion

Weonmook Lee's contributions to plasma technology through his patents demonstrate his commitment to innovation and excellence in his field. His work continues to influence advancements in plasma applications, showcasing the importance of research and development in technology.

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