The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Apr. 01, 2009
Kunjoo Park, Suwon-Si, KR;
Hwankook Chae, Suwon-Si, KR;
Sungyong Ko, Suwon-Si, KR;
Keehyun Kim, Suwon-Si, KR;
Weonmook Lee, Suwon-Si, KR;
Kunjoo Park, Suwon-Si, KR;
Hwankook Chae, Suwon-Si, KR;
Sungyong Ko, Suwon-Si, KR;
Keehyun Kim, Suwon-Si, KR;
Weonmook Lee, Suwon-Si, KR;
DMS Co., Ltd., Suwon, KR;
Abstract
A plasma chemical reactor is provided. The reactor includes a chamber, a cathode assembly, and a baffle plate. The chamber forms a plasma reaction space. The cathode assembly includes a cathode support shaft and a substrate support. The cathode support shaft is coupled at one side to a wall surface of the chamber. The substrate support is coupled to the other side of the cathode support shaft and supports the substrate. The baffle plate is out inserted and coupled to the substrate support, and has a plurality of vents arranged to be spaced apart and through formed such that reaction gas can pass through, and the vents asymmetrically arranged and formed to get a vent area smaller at an opposite side than a top side of the cathode support shaft.