The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Aug. 30, 2010
Minshik Kim, Suwon, KR;
Sungyong Ko, Suwon, KR;
Hwankook Chae, Suwon, KR;
Kunjoo Park, Suwon, KR;
Keehyun Kim, Suwon, KR;
Weonmook Lee, Suwon, KR;
Minshik Kim, Suwon, KR;
Sungyong Ko, Suwon, KR;
Hwankook Chae, Suwon, KR;
Kunjoo Park, Suwon, KR;
Keehyun Kim, Suwon, KR;
Weonmook Lee, Suwon, KR;
DMS Co., Ltd., Suwon, KR;
Abstract
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.