The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Oct. 20, 2008
Hwankook Chae, Suwon-si, KR;
Dongseok Lee, Yongin-si, KR;
Heeseok Moon, Pyeongtaek-si, KR;
Kunjoo Park, Suwon-si, KR;
Keehyun Kim, Suwon-si, KR;
Weonmook Lee, Suwon-si, KR;
Hwankook Chae, Suwon-si, KR;
Dongseok Lee, Yongin-si, KR;
Heeseok Moon, Pyeongtaek-si, KR;
Kunjoo Park, Suwon-si, KR;
Keehyun Kim, Suwon-si, KR;
Weonmook Lee, Suwon-si, KR;
DMS Co., Ltd., Kyungki-Do, KR;
Abstract
A plasma chemical reactor includes a chamber for providing a plasma reaction space, and a cathode assembly coupled at one side to a wall surface of the chamber and supporting a substrate at the other side such that the substrate is positioned at a center inside the chamber, and installed to enable height adjustment such that the substrate can maintain a horizontal state.