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Hsinchu, Taiwan

Wen-Tai Lu

This inventor holds 8 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Tai Lu. Retrieved from https://idiyas.com/inventor/wen-tai-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 75.0

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 35(Granted Patents)


Company Filing History:

goldMedal8 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2014-2019

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8 patents (USPTO):Explore Patents
1. 10269568 - Multi-gate FETs and methods for forming the same (2019-04-23),
2. 10103025 - Multi-gate FETs and methods for forming the same (2018-10-16),
3. 9653581 - Semiconductor device and method of making (2017-05-16),
4. 9508714 - Multi-gate FETs and methods for forming the same (2016-11-29),
5. 9252271 - Semiconductor device and method of making (2016-02-02),
6. 9166044 - Raised epitaxial LDD in MuGFETs (2015-10-20),
7. 9123564 - Semiconductor device with conformal doping and method of making (2015-09-01),
8. 8883570 - Multi-gate FETs and methods for forming the same (2014-11-11),

Title: The Innovations of Wen-Tai Lu

Introduction

Wen-Tai Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advanced methods for forming multi-gate field-effect transistors (FETs), which are crucial for modern electronic devices.

Latest Patents

One of his latest patents involves a method for forming multi-gate FETs. This method includes oxidizing a semiconductor fin to create an oxide layer on opposite sidewalls of the fin. The semiconductor fin is positioned over the top surface of an isolation region. Following the oxidation process, a tilt implantation is performed to implant an impurity into the semiconductor fin. The oxide layer is subsequently removed after the tilt implantation, enhancing the performance and efficiency of the FETs.

Career Highlights

Wen-Tai Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and technical expertise have positioned him as a key player in the development of next-generation semiconductor technologies.

Collaborations

Wen-Tai Lu has collaborated with notable colleagues, including Hou-Yu Chen and Yu-Chang Lin. Their teamwork has contributed to the advancement of semiconductor research and development.

Conclusion

Wen-Tai Lu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in electronic devices and systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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